Water-borne, alkali-developable, photoresist coating compositions and their preparation
US5045435A · kind A · utility
88Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1990 |
| Grant date | Sep 3, 1991 |
| Priority date | — |
| Expiry date | Mar 12, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An aqueous photopolymer composition is produced by adding a monomer to a latex of a partially neutralized carboxylated acrylic copolymer, having an acid number greater than 80, along with photoinitator and components to produce an aqueous coatable and alkali developable photoresist composition. Preferred neutralization is 30-50% for dip-coating and 40-60% for screen-printing to produce 1 mil lines and 1 mil space after ultraviolet exposure and mild alkali development.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.