Process for the lithographic manufacture of electroformable microstructures having a triangular or trapezoidal cross-section

US5045439A · kind A · utility

Assignee

• Kernforschungszentrum Karlsruhe GmbH · DE

Inventors

• Asim Maner · Blankenloch, DE
• Jurgen Mohr · Eppingen, DE

Key dates

• Filing date: Dec 18, 1989
• Grant date: Sep 3, 1991
• Expiry date: Dec 18, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/12
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A process for the lithographic manufacture of electroformable microstructure having a triangular or trapezoidal cross-section from a resist material. A composite body is provided which is comprised of a layer of resist material on an electrically conductive substrate. The resist layer is irradiated to form irradiated band regions in the resist layer by conducting a first irradiation in which the substrate having the resist layer thereon is positioned at an angle of +.alpha. relative to a plane orthogonal to the incident radiation to form a first set of band-shaped regions, and a second irradiation in which the substrate is positioned at an angle of -.alpha. relative to a plane orthogonal to the incident radiation to form a second set of band-shaped regions which overlap the first set at the interface between the resist layer and the substrate. The irradiated regions of the resist layer are developed to produce microstructures.