Laminar flow system for drying parts
US5048201A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 13, 1990 |
| Grant date | Sep 17, 1991 |
| Priority date | — |
| Expiry date | Jul 13, 2010 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B21/003
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system for drying microelectronic, optical and other parts that in the course of their processing are rendered wet with solvents or other liquids, which if not fully evaporated from the parts will contaminate and impair their quality. The system includes an open-ended drying chamber having a work zone intermediate its sides in which the parts to be dried are supported for exposure to a gas stream. One end of the chamber defines a gas inlet to admit the gas stream which sweeps the entire chamber. Coupled to the drying chamber is a pressure chamber in which a submicron particle filter unit of the Hepa type producing a relatively low pressure drop is disposed to cover the gas inlet. Gas fed into the pressure chamber and heated to an elevated temperature imposes a distributed pressure on the entry face of the filter unit and passes therethrough to yield at its exit face a laminar stream of hot gas that subjects the parts in the work zone to a substantially uniform drying action, so that all parts being treated are fully dried.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.