Preparation of urethane prepolymers having low levels of residual toluene diisocyanate
US5051152A · kind A · utility
12Cited by
21References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 1989 |
| Grant date | Sep 24, 1991 |
| Priority date | — |
| Expiry date | Sep 26, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G18/7621
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A wiped film evaporation process for reducing the amount of residual toluene diisocyanate in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.