Method of manufacturing an optical waveguide by switching a d.c. voltage
US5052769A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1990 |
| Grant date | Oct 1, 1991 |
| Priority date | — |
| Expiry date | Mar 30, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1342
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a method of manufacturing an optical waveguide which comprises a substrate having a first refractive index and a light-transmitting passage which is buried into the substrate and which is formed by an ionizable substance having a second refractive index greater than the first refractive index, the ionizable substance is diffused into the substrate from an overlying layer through a diffusion-suppressing layer by impressing a positive polarity of a d.c. voltage and forms a diffused region. Thereafter, the ionizable substance is partially released from the diffused region towards the overlying layer by impressing a negative polarity of the d.c. voltage. A configuration of the diffused region is thus controlled during impression of the negative polarity of the d.c. voltage and formed into the light-transmitting passage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.