Substrate cleaning device
US5054421A · kind A · utility
17Cited by
4References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 1989 |
| Grant date | Oct 8, 1991 |
| Priority date | — |
| Expiry date | May 18, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23G5/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate cleaning device comprises a gas jet nozzle for jetting gas toward a substrate, an electron beam irradiation selection for irradiating electron beams into the jetted gas to induce glow discharge, and an ion acceleration section for drawing ions out of the glow discharge to impart the ions with energy, causing the ions to uniformly bombard onto the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.