Phosphonium compounds and processes for their preparation

US5055619A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Jorg Gitzel · Hattersheim, DE
• Hans-Tobias Macholdt · Darmstadt, DE
• Wolfgang Knaup · Altötting, DE

Key dates

• Filing date: Apr 12, 1990
• Grant date: Oct 8, 1991
• Expiry date: Apr 12, 2010

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C07F9/5456
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Phosphonium compounds of formula (I): ##STR1## in which at least one of the radicals R.sub.1 to R.sub.4 is a fluorine-substituted, saturated alkyl radical having 1 to 30 carbon atoms and 3 to 50 fluorine atoms, which can contain further substituents, or at least one of the radicals R.sub.1 to R.sub.4 is a fluorine-substituted aryl radical or an aralkyl radical substituted by fluorine on the aromatic ring, it being possible for the aryl or aralkyl radical to be further substituted on the aromatic ring, and the alkyl bridge between the phosphorus atom and the aromatic ring, in the case of an aralkyl radical, containing 1 to 30 carbon atoms, and at most three of the radicals R.sub.1 to R.sub.4 independently of the others are hydrogen atoms, unsaturated or saturated, substituted or unsubstituted C.sub.1 -C.sub.30 alkyl radicals or aryl or aralkyl radicals which can be substituted on the aromatic ring, and R.sub.5 to R.sub.8 are aryl radicals, aralkyl radicals or halogenoaryl radicals, and their preparation by reacting compounds of formula (II): ##STR2## in which R.sub.1 to R.sub.4 are as defined and X.sup.- is a halogen anion, with a borate salt, in water or mixtures of water and an or…