Process for imparting stain-resist agent
US5057121A · kind A · utility
22Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 1989 |
| Grant date | Oct 15, 1991 |
| Priority date | — |
| Expiry date | Aug 4, 2009 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06M2101/34
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A process for imparting stain resistance to polyamide substrates in continuous processes such as those using a Fluidyer.RTM. apparatus or a Flexnip.RTM. applicator and involving the application of a stain-resist composition containing a mixture of a hydrolyzed copolymer of maleic anhydride and one or more ethylenically unsaturated aromatic monomers with a sulfonated phenol-formaldehyde condensation product is disclosed wherein the stain-resist composition is applied at a pH between about 1.5 and about 3.0 in the prescence of an anionic surfactant in the form of an alkyl aryl sulfonic acid or an alkyl aryl sulfonate salt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.