Process for making a device with a three-dimensionally tapered point
US5057401A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1990 |
| Grant date | Oct 15, 1991 |
| Priority date | — |
| Expiry date | Mar 7, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/00
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Process for preparing a pointed device by a photochemical process by coating the top and bottom surfaces of a sheet material with a light-sensitive photoresist, exposing the photoresist with light through a light-impenetrable mask in the form of an image of the device shaped with a blunt end at the tip of the point to compensate for lateral etching during the etching step, said image on the top surface being slightly offset relative to the image on the bottom surface, further exposing with light a portion of the image of the point of the device on the top surface of the sheet material, said exposure conforming generally to a V-shaped configuration running along the inside perimeter of the point, removing exposed photoresist, and then contacting the treated sheet material with an etchant to remove material not protected by the remaining photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.