Method of forming an antifuse element with substantially reduced capacitance using the LOCOS technique
US5057451A · kind A · utility
47Cited by
6References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 12, 1990 |
| Grant date | Oct 15, 1991 |
| Priority date | — |
| Expiry date | Apr 12, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/981
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A minimum sized aperture for a reduced capacitance anti-fuse or other structure may be formed by birds beak encroachment of thick oxide under a masking layer or by isotropic etching of a masking layer followed by birds beak encroachment of thick oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.