Apparatus and method for correcting for drift in production of objects by stereolithography
US5059021A · kind A · utility
93Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 1988 |
| Grant date | Oct 22, 1991 |
| Priority date | — |
| Expiry date | Nov 8, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/49013
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An apparatus and a method for correcting for drift in production of objects by stereolithography is disclosed. A beam sensor comprising a pinhole in a plate and a photodector behind the pinhole is used to obtain the apparent position of the beam at calibration time and subsequently. A comparison between the prior and present apparent position of the sensor is made in order to determine a drift error correction term to be used to compensate for drift and thereby improve the accuracy and pointing repeatability of the scanning mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.