Single-chamber apparatus for in-situ generation of dangerous polyatomic gases and radicals from a source material contained within a porous foamed structure
US5059292A · kind A · utility
9Cited by
6References
32Claims
0Family size
Inventors
Key dates
| Filing date | Aug 27, 1990 |
| Grant date | Oct 22, 1991 |
| Priority date | — |
| Expiry date | Aug 27, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single-chamber apparatus and method are described for in-situ generation of dangerous polyatomic gases and radicals from solid or liquid source materials contained within a porous foamed structure. A cooled cathode is provided for establishing a plasma discharge within the chamber, and a heat source is provided to maintain the porous foamed structure within a fixed temperature range chosen such that the source material is removed from the porous foamed structure by evaporation induced by heat from the heat source while at the same time preventing consumption by evaporation of the porous foamed structure itself.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.