Rapid thermal process for obtaining silica coatings
US5059448A · kind A · utility
60Cited by
7References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1990 |
| Grant date | Oct 22, 1991 |
| Priority date | — |
| Expiry date | Jun 18, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02345
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is based on the discovery that rapid thermal processing (RTP) can convert hydrogen silsesquioxane resin coatings to ceramic silica coatings. This technique is especially valuable for the application of protective and dielectric layers on electronic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.