Amorphous fluoropolymer pellicle films
US5061024A · kind A · utility
29Cited by
12References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 6, 1989 |
| Grant date | Oct 29, 1991 |
| Priority date | — |
| Expiry date | Sep 6, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle comprising a thin, durable film of substantially uniform thickness which absorbs less than 10% light at wavelengths between 190 and 820 nanometers, tautly adhered to one edge of an enclosed support frame, said thin film comprising amorphous fluoropolymers having a refractive index between 1.24 and 1.41. Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.