Ionization chamber dosimeter
US5061216A · kind A · utility
0Cited by
7References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 16, 1990 |
| Grant date | Oct 29, 1991 |
| Priority date | — |
| Expiry date | Apr 16, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J47/001
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for fabricating an ion chamber dosimeter collecting array of the type utilizing plural discrete elements formed on a uniform collecting surface which includes forming a thin insulating layer over an aperture in a frame having surfaces, forming a predetermined pattern of through holes in the layer, plating both surfaces of the layer and simultaneously tilting and rotating the frame for uniform plate-through of the holes between surfaces. Aligned masking and patterned etching of the surfaces provides interconnects between the through holes and copper leads provided to external circuitry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.