Silicon naphthalocyanines and thin radiation sensitive coating films containing same

US5061596A · kind A · utility

Assignee

• BASF SE

Inventors

• Bernhard Albert · Monsheim, DE
• Peter Neumann · Wiesloch, DE
• Sibylle Brosius · Ludwigshafen, DE

Key dates

• Filing date: Mar 10, 1989
• Grant date: Oct 29, 1991
• Expiry date: Mar 10, 2009

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/146
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Thin radiation sensitive coating films contain silicon naphthalocyanines of the formula ##STR1## where Nc is the radical of a naphthalocyanine system which may be substituted by C.sub.1 -C.sub.10 -alyl or C.sub.1 -C.sub.10 -alkoxy, and PA0 R.sup.1 and R.sup.2 are indentical or different and each is independently of the other a radical of the formula ##STR2## where R.sup.3 is branched C.sub.6 -C.sub.20 -alkyl of the formula ##STR3## where n is from 1 to 5 and R.sup.6 and R.sup.7 independently of each other are C.sub.1 -C.sub.16 -alkyl, and R.sup.4 and R.sup.5 are independently of each other C.sub.1 -C.sub.10 -alkyl or the radical OR.sup.3 where R.sup.3 is as defined above, or the radical R.sup.1 may also be C.sub.1 -C.sub.10 -alkyl.