Production of thin layers of a high temperature superconductor (HTSC) by a plasma-activated physical vapor deposition process, and cathodes used therein

US5061684A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Helmut Freller · Westerburg, DE
• Peter Schack · Nuremberg, DE

Key dates

• Filing date: Sep 25, 1989
• Grant date: Oct 29, 1991
• Expiry date: Sep 25, 2009

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/325
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In the process according to the invention, material is vaporized off a cathode and deposited on a substrate in a cathodic arc vaporization process, the arc base being moved on the cathode surface in a random or controlled manner. In the arc vaporization process, preferably at least two cathodes of different alloys or mixtures of the metallic components of the high temperature superconductor (HTSC) are activated for vaporization by an arc and the materials vaporized out of the different alloys are jointly deposited on the substrate, the arc vaporization process occurring reactivity under oxygen atmosphere of preset O.sub.2 partial pressure. A heat treatment for adjusting the structure and oxygen stoichiometry suitable for superconduction can be carried out after or during the vaporizing process.