Surface cleaning using a cryogenic aerosol
US5062898A · kind A · utility
211Cited by
1References
17Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jun 5, 1990 |
| Grant date | Nov 5, 1991 |
| Priority date | — |
| Expiry date | Jun 5, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67028
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method is disclosed for cleaning microelectronics surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.