Method for increasing the yield of trichlorosilane in the fluidized-bed hydrochlorination of silicon
US5063040A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 23, 1990 |
| Grant date | Nov 5, 1991 |
| Priority date | — |
| Expiry date | Jan 23, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S423/06
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for increasing the trichlorosilane yield in the hydrochlorination of silicon in a fluidized bed involves chilling the gas mixture issuing from the fluidized bed in the shortest possible time immediately after leaving the fluidized bed to temperatures below 550.degree. C. When the temperature of the fluidized bed is below 550.degree. C., the gas mixture is chilled to temperature 100.degree. C. lower than the reaction temperature in the fluidized bed. The method makes it possible, at a reaction temperature of, for example, 800.degree. C. to increase the 16 to 20% trichlorosilane yields obtained formerly at this temperature to 55%, especially when gaseous silicon tetrachloride is also added to the fluidized bed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.