Patent · US Expired

Method for processing the residues of a chlorosilane distillation

US5066472A · kind A · utility

9Cited by

6References

8Claims

0Family size

Assignee

Huels Aktiengesellschaft · DE

Inventors

Klaus Ruff · Troisdorf, DE
Bernhard Falk · Rheinfelden (Baden), DE
Werner Gratz · Rheinfelden (Baden), DE

Key dates

Filing date	Feb 17, 1989
Grant date	Nov 19, 1991
Priority date	—
Expiry date	Feb 17, 2009

Classification

Technology area (CPC A)Human Necessities
CPC primaryA62D2101/22
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Disclosed is a method for the processing of the residues that occur in the production of chlorosilane. The processing is performed by the separation of the residual chlorosilanes, followed by hydrolysis of these residues with water vapor. The water vapor used has a temperature between 100.degree. and 300.degree. C. and additionally contains hydrogen chloride. The hydrolysis residues occurring in the present method have an extremely small chloride content and can be transported, if desired, directly to a dump. The hydrogen chloride that is released can be absorbed in water and removed as hydrochloric acid or can be desorbed for further technical use. Preferably it is reused for chlorosilane production.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.