Cryogenic process for the production of an oxygen-free and methane-free, krypton/xenon product
US5067976A · kind A · utility
15Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1991 |
| Grant date | Nov 26, 1991 |
| Priority date | — |
| Expiry date | Feb 5, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S62/925
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention relates to a process for the production of kryton and xenon by using an oxygen-free vapor stream to strip a liquid stream containing oxygen, krypton, methane, and xenon of methane and oxygen. This is accomplished by properly controlling the liquid to vapor flow ratio in the distillation column so that such ratio is less than 0.15. A suitable reflux liquid is used to decrease the loss of krypton and xenon in the methane and oxygen laden vapor stream leaving the distillation system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.