Dense phase gas photochemical process for substrate treatment
US5068040A · kind A · utility
94Cited by
9References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 3, 1989 |
| Grant date | Nov 26, 1991 |
| Priority date | — |
| Expiry date | Apr 3, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S210/908
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.