Radiation-sensitive positive working composition and copying material

US5068163A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Andreas Elsaesser · Idstein, DE
• Werner Frass · Wiesbaden, DE
• Dieter Mohr · Appenheim, DE

Key dates

• Filing date: Jun 7, 1989
• Grant date: Nov 26, 1991
• Expiry date: Jun 7, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of: PA0 1) a compound forming strong acid when exposed to actinic radiation and PA0 2) a compound containing at least one acid-cleavable C--O--C bond, and a binder with repeating units of the general formula I ##STR1## wherein R.sub.1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group, PA1 R.sub.2, R.sub.3, R.sub.4 are identical or different and denote hydrogen, or alkyl or aryl groups, PA1 R.sub.5, R.sub.6 and optionally R.sub.7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, and PA1 X denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, and PA1 n is 1, 2 or 3. The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.