Thin film forming apparatus
US5069157A · kind A · utility
4Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1990 |
| Grant date | Dec 3, 1991 |
| Priority date | — |
| Expiry date | Aug 24, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thin film forming apparatus which forms a thin film over the film forming surface of a substrate by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate heated to a given temperature. The substrate conveying direction is reversible, or a nozzle for spouting the mist into a film forming chamber and an exhaust duct are connected removably to a hearth forming the bottom wall of the film forming chamber and can be switched with one another. The film forming apparatus is capable of forming thin films of different laminate constructions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.