Patent · US Expired

Positive and negative working radiation sensitive mixtures and production of relief patterns

US5069997A · kind A · utility

52Cited by
3References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 16, 1989
Grant dateDec 3, 1991
Priority date
Expiry dateMay 16, 2009

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0045
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.