Method of controlling surface potential of photoconductive element
US5072258A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 7, 1990 |
| Grant date | Dec 10, 1991 |
| Priority date | — |
| Expiry date | Aug 7, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G15/5037
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of controlling the surface potential of a photoconductive element included in an electrophotograpic copier or similiar image forming apparatus. When the background area of a photoconductive element is contaminated due to the shaving of the photoconductive film provided on the photoconductive element or similar type of cause, the method increases the amount of light for imagewise exposure. When the contamination is ascribable to residual potential on the surface of the photoconductor element, the method increases bias potential for development and charge potential. The method, therefore, adequately controls the background contamination ascribable to the change in the sensitivity of the photoconductive element which is in turn ascribable to different types of causes, i.e., the increase in the residual potential and the shaving of the photoconductive film or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.