Patent · US Expired

Radiation-sensitive mixture containing acid labile groups and production of relief patterns

US5073474A · kind A · utility

16Cited by

8References

10Claims

0Family size

Assignee

BASF SE

Inventors

Reinhold Schwalm · Monsheim, DE
Horst Binder · Lampertheim, DE
Andreas Boettcher · Leimen, DE

Key dates

Filing date	May 16, 1989
Grant date	Dec 17, 1991
Priority date	—
Expiry date	May 16, 2009

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/168
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation sensitive mixture suitable for producing relief patterns contains PA1 (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and PA1 (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analaogous reaction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.