Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride
US5075194A · kind A · utility
0Cited by
12References
7Claims
0Family size
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Key dates
| Filing date | Jan 9, 1990 |
| Grant date | Dec 24, 1991 |
| Priority date | — |
| Expiry date | Jan 9, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist composition and formulation comprising a resin matrix and a photosensitizer obtained from 1-oxo-2-diazo naphthalene-4-sulfonic acid chloride, on 1-oxo-2-diazo naphthalene-5-sulfonic acid chloride and spiroglycol to form 4,4-diester or 5,5-diester.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.