Radiation sensitive mixture and production of relief patterns

US5075199A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold Schwalm · Monsheim, DE
• Horst Binder · Lampertheim, DE

Key dates

• Filing date: May 16, 1989
• Grant date: Dec 24, 1991
• Expiry date: May 16, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A radiation sensitive mixture useful for producing relief patterns contains PA1 (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and PA1 (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid, wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having ##STR1## in copolymerized or cocondensed form or the ##STR2## introduced by polymer analogous reaction with the proviso that the radical R contains from 5 to 9 carbon atoms.