Exposure apparatus
US5075718A · kind A · utility
6Cited by
10References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1990 |
| Grant date | Dec 24, 1991 |
| Priority date | — |
| Expiry date | Nov 21, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
With an exposure apparatus according to the present invention, it is possible to project an image of a mask in a any large number onto a band-shaped film sequentially in a longitudinal direction with high precisions in position, magnification and focus. Thus, the apparatus can be provided for fabrication of an FPC film of a high circuit density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.