Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type
US5077091A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 14, 1990 |
| Grant date | Dec 31, 1991 |
| Priority date | — |
| Expiry date | Feb 14, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/36
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of: PA1 an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula: EQU [Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.y PA1 a nitrogen precursor selected from ammonia and hydrazine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.