Positive working dry film element having a layer of resist composition
US5077174A · kind A · utility
40Cited by
4References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 1990 |
| Grant date | Dec 31, 1991 |
| Priority date | — |
| Expiry date | Apr 10, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.