Photo-mask
US5079113A · kind A · utility
20Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 1989 |
| Grant date | Jan 7, 1992 |
| Priority date | — |
| Expiry date | Dec 14, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/48
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.