Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
US5079129A · kind A · utility
26Cited by
23References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 1989 |
| Grant date | Jan 7, 1992 |
| Priority date | — |
| Expiry date | Nov 30, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
The present invention relates to a negative photoresist consisting essentially of PA0 a) at least one solid film-forming polyphenol, PA0 b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule, PA0 c) at least one cationic photoinitiator for component b) and PA0 d) if appropriate customary additives. The resist can be developed under aqueous-alkaline conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.