Schottky diode
US5079596A · kind A · utility
2Cited by
3References
20Claims
0Family size
Inventors
Key dates
| Filing date | Apr 5, 1989 |
| Grant date | Jan 7, 1992 |
| Priority date | — |
| Expiry date | Apr 5, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
Abstract
A schottky diode consists of a substrate from gallium/arsenide (5) on which epitaxially a monocrystalline gallium/arsenide layer (6) doped with silicium is applied. For creating the Schottky contact, a monocrystalline erbium/arsenide layer or ytterbium/arsenide layer (7) is epitaxially applied on this layer. Following as a covering layer is a highly doped gallium/arsenide layer (8).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.