Patent · US Expired

Process and apparatus for roughening a substrate for photosensitive layers

US5082537A · kind A · utility

10Cited by

6References

11Claims

0Family size

Assignee

Hoechst GmbH · DE

Inventors

Joachim Stroszynski · Wiesbaden, DE
Heinz Boergerding · Eltville am Rhein, DE
Peter Lehmann · Oebisfelde, DE

Key dates

Filing date	Mar 29, 1990
Grant date	Jan 21, 1992
Priority date	—
Expiry date	Mar 29, 2010

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S204/09
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A mechanically roughened substrate is conveyed through an electrolytic bath and is given a superposed electrochemical roughening, which is carried out by means of electrodes which are arranged in the electrolytic bath at a specific spacing from the substrate. The electrodes are connected to corresponding windings on the secondary side of a three-phase transformer. The corresponding windings on the primary side of the three-phase transformer are connected to a three-phase frequency converter, to which three-phase current is applied via leads. The three-phase frequency converter transforms the line frequency of the three-phase current supplied into a frequency range of about 50 to 300 Hz at a voltage of between about 1 and 380 V.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.