Heat developable photosensitive material
US5082763A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 1991 |
| Grant date | Jan 21, 1992 |
| Priority date | — |
| Expiry date | Mar 5, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat developable photosensitive material comprising a support having thereon at least one photosensitive silver halide emulsion layer, which contains at least one compound selected from those represented by the following general formulae (I) and (II) to acquire a high S/N ratio and high sensitivity: ##STR1## wherein R represents an alkylene group, an alkenylene group, an aralkylene group or an arylene group, which each may be substituted; Y represents ##STR2## R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each represents a hydrogen atom, or a substituted or unsubstituted alkyl, aryl, alkenyl or aralkyl group; X represents ##STR3## R' represents a hydrogen atom, or a substituted or unsubstituted alkyl or alkenyl group; R" represents a hydrogen atom, or a substitutive group therefor; M represents a hydrogen atom, an alkali metal ion, an ammonium group, or a group capable of being cleaved under an alkaline condition; n represents 0 or 1; m represents 1 or 2; l represents 4-m; Z represents a substituted or unsubstituted amino, quaternary ammonium, sulfonyl, carbamoyl, sulfamoyl, carbonamido, sulfonamido, ureido, alkylthio, alkoxy or hete…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.