Rotational flexure stage
US5083757A · kind A · utility
30Cited by
2References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 5, 1990 |
| Grant date | Jan 28, 1992 |
| Priority date | — |
| Expiry date | Jul 5, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
The flexure stage disclosed herein is useful in aligning a semiconductor wafer during microlithographic exposure to define circuit elements on the surface of the wafer. The stage is a unitary structure which permits essentially lossless small angle relative rotation of a central portion of the stage with respect to an outer, annular portion of the stage. Three pairs of slots define three links extending radially with respect to the axis of rotation and, radially outwardly from each pair of slots, a respective transverse slot in the outer portion provides radial compliance for the outer end of the respective link.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.