Positive-working, radiation-sensitive mixture based on acid-cleavable and photochemically acid-forming compounds, and the production of relief patterns and relief images

US5084371A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold Schwalm · Monsheim, DE
• Horst Binder · Lampertheim, DE
• Rudolf Schuhmacher · Böhl-Iggelheim, DE

Key dates

• Filing date: Apr 14, 1989
• Grant date: Jan 28, 1992
• Expiry date: Apr 14, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive-working, radiation-sensitive mixture and a process for the production of relief images. The radiation-sensitive mixture contains PA0 (a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions and PA0 (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a further group which produces a strong acid on exposure to radiation, the polymeric binder (a) consisting a mixture of a phenolic polymer and a resin of the novolak type. The novel mixture is particularly suitable for the production of photoresists.