Hydrazine bath for chemical deposition of platinum and/or palladium, and method of manufacturing such a bath
US5085693A · kind A · utility
5Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1990 |
| Grant date | Feb 4, 1992 |
| Priority date | — |
| Expiry date | Oct 10, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/44
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The bath contains an oxalate of the metal or of each of the metals to be deposited and hydrazine as a reducing agent, together with ethylenediamine as a complexing agent and at least one stabilizing agent, said bath being highly basic and having an autocatalytic effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.