Patent · US Expired

Secondary ion mass analyzing apparatus

US5086227A · kind A · utility

4Cited by
1References
9Claims
0Family size

Assignees

Inventors

Key dates

Filing dateOct 18, 1990
Grant dateFeb 4, 1992
Priority date
Expiry dateOct 18, 2010

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J49/26
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A secondary ion mass analyzing apparatus is suitable for a depth directional analysis of a specimen. The apparatus includes means for forming an image of said secondary ions, an aperture disposed on a position in which the secondary ion image is formed, means for detecting the secondary ions which have passed through the aperture and for converting the detected ions into electrical signals, and means for displaying an image of said aperture based on the electrical signals. In such a manner, the aperture is disposed on the secondary ion image forming position. The image of the aperture is displayed on the image displaying apparatus by using the secondary ions which have passed through the aperture. If the ion image is not formed on the position of the aperture, the contour of the aperture image would be unclear while if the ion image is formed on the position of the aperture, the contour of the aperture image would be clear. Accordingly, by monitoring the clearness of the aperture image, focusing of the ion image upon the aperture position may be determined. Therefore, the secondary ions which have generated from the specimen corresponding to a portion other than the central portion…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.