Thin film forming apparatus having adjustable guide
US5086727A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1990 |
| Grant date | Feb 11, 1992 |
| Priority date | — |
| Expiry date | Aug 24, 2010 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B13/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A thin film forming apparatus which forms a thin film over a surface of a subtrate by spraying a mist of a source solution produced by atomization over the surface of the substrate heated to a given temperature. The film forming apparatus is provided with a pair of guide members for supporting and guiding the substrate at opposite sides of the same. The distance between the opposite inner surfaces of the guide members can be changed according to the width of the substrate to be supported and guided by the pair of guide members. The distance between the respective lower portions of the opposite inner surfaces of the pair of guide members is greater than the distance between the upper portions of the opposite inner surfaces of the same, so that the distribution of the flow rate per unit flow passage area of the mist of the source solution is uniform with respect to the width of the substrate and enables a thin film of a uniform thickness to be formed over the entire surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.