Protective coating useful as a passivation layer for semiconductor devices
US5087959A · kind A · utility
49Cited by
8References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1988 |
| Grant date | Feb 11, 1992 |
| Priority date | — |
| Expiry date | Mar 2, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/19041
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A protective coating useful as a passivation layer for semiconductor devices incorporates a thin film of an amorphous diamond-like carbon. In one implementation, a thin film of amorphous silicon is deposited over the carbon material. The semiconductive passivation coating prevents electrical shorts, dissipates charge build-up and protects against chemical contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.