Method for pyrolxtically forming a silicon oxide coating on a hot glass substrate
US5089039A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1990 |
| Grant date | Feb 18, 1992 |
| Priority date | — |
| Expiry date | Jun 14, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of pyrolytically forming a silicon oxide coating on a hot glass substrate as it travels past a coating chamber includes contacting the substrate with silane-containing coating precursor material in the presence of oxygen. The silane-containing coating precursor material is in the vapor phase and it and gaseous oxygen are intimately mixed before they enter the coating chamber to contact the substrate. Silane as coating precursor material may be conveyed towards the coating chamber in vapor phase in a substantially inert carrier gas stream and oxygen introduced into the silane-containing carrier gas stream before it enters the coating chamber. The coating operation may take place within a coating chamber within a float chamber in which the glass is formed into ribbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.