Patent · US Expired

Process for preparing disilane by using molecular sieves

US5089244A · kind A · utility

51Cited by
3References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 24, 1990
Grant dateFeb 18, 1992
Priority date
Expiry dateSep 24, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/046
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Process for preparing disilane, wherein a raw gas including monosilane, disilane, trisilane and impurities such as phosphine, hydrogen sulfide, arsine, disiloxane and higher siloxanes, undergoes a step of separation by distillation for the substantial elimination of the other compounds of silicon, except disiloxane, and the substantial elimination of phosphine, hydrogen sulfide and arsine impurities, wherein a final purification of the disilane takes place by selective adsorption on molecular sieves, in which one is a sieve of type 3 A and which is used for the elimination of the siloxanes and hydrogen sulfide and the other is a sieve of type 4 A for the elimination of phosphine and arsine.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.