Atomized thin film forming apparatus
US5090360A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 1991 |
| Grant date | Feb 25, 1992 |
| Priority date | — |
| Expiry date | Jan 3, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
There is disclosed an atomized thin film forming apparatus for forming a thin film by spouting an atomized source solution toward a heated substrate. A pair of inner wall surfaces defined at the upper portion of a film forming nozzle and disposed opposite to each other with respect to the longitudinal direction of a film forming chamber are restricted so as to gradually narrow in the interval therebetween toward a spouting opening in a smooth curve. Hence, it is possible to prevent a mist of the source solution atomized by the atomizer from being locally stagnant in the film forming nozzle and prevent a precipitate of the atomized source solution from growing. Consequently, the flow of the mist of the source solution is not hindered by the precipitation of the atomized source solution so that the thin film is formed over the surface of the substrate at a high uniformity for a long period of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.