Photoresist stripper

US5091103A · kind A · utility

Inventors

• Alicia Dean · Poughkeepsie, US
• John A. Fitzsimmons · Poughkeepsie, US
• Janos Havas · Hopewell Junction, US
• Barry C. McCormick · Poughkeepsie, US
• Prabodh R. Shah · Wappingers Falls, US

Key dates

• Filing date: May 1, 1990
• Grant date: Feb 25, 1992
• Expiry date: May 1, 2010

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/425
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105.degree. C.-125.degree. C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.