Substrate for phospholipase

US5091527A · kind A · utility

Assignee

• Boehringer Mannheim GmbH · DE

Inventors

• Martina Junius · Bernried, DE
• Ulrich Neumann · Peißenberg, DE
• Herbert von der Eltz · Spaichingen, DE

Key dates

• Filing date: Mar 2, 1989
• Grant date: Feb 25, 1992
• Expiry date: Mar 2, 2009

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C12Q1/44
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The present invention provides phospholipase substrates of the general formula: ##STR1## wherein A is an alkylene or alkenylene radical containing up to 16 carbon atoms, R is a hydrgen atom or an alkyl, alkenyl or acyl radical containing up to 20 carbon atoms or an optionally alkyl-substituted aryl or aralkyl radical containing up to 8 carbon atoms in the alkyl moiety, X is the residue of an aromatic hydroxy or thiol compound and each Y, independently of one another, is an oxygen or sulphur atom and Z is --SO.sub.3.sup..crclbar. or a radical of the general formula: ##STR2## wherein R.sup.1 can be a hydrogen atom or a radical of the general formula --(CH.sub.2).sub.n NR.sub.3.sup.2, in which n is 2, 3 or 4 and R.sup.2 is a hydrogen atom or a methyl radical, or is an inositol or serine (--CH.sub.2 --CH(NH.sub.2)--COOH) or glycerol residue. The present invention also provides a process for the optical determination of phospholipases using these substrates, as well as a reagent containing them.