Method and device for analyzing gas in process chamber
US5093571A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 1990 |
| Grant date | Mar 3, 1992 |
| Priority date | — |
| Expiry date | Jul 2, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas in a process chamber, such as a sputtering chamber, having a typical inside pressure of 10.sup.-1 to 10.sup.-3 Torr, is analyzed by a mass spectrometer, which should be used at a pressure range of lower than around 10.sup.-4 Torr. The method comprises evacuating a process chamber by a vacuum pump and supplying a gas to the process chamber, whereby a pressure in the process chamber is determined by the vacuum pump and the supplied gas, and that pressure in the process chamber is higher than a pressure in the vacuum pump, and analyzing the gas at a portion of or around the vacuum pump, which portion has a pressure lower than the pressure in the process chamber, by using a mass spectrometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.