Patent · US Expired

Process for forming diamond film

US5094878A · kind A · utility

22Cited by
2References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 19, 1990
Grant dateMar 10, 1992
Priority date
Expiry dateJun 19, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/513
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A device for synthesizing a diamond at a high synthesis speed and obtaining an improved purity of diamond is provided, and is characterized by having a vacuum vessel maintained under a predetermined vacuum; a positive electrode and a negative electrode arranged within the vacuum vessel so as to be opposed to each other; an arc discharge power source electrically connected to the positive electrode and the negative electrode and applying a predetermined power to cause an arc discharge in a space between the positive electrode and the negative electrode; a gas supply source which generates a gas plasma by flowing a plasma source gas over the arc discharge, and blowing a resulting gas plasma containing a carbon source gas over a substrate arranged downstream thereof; an electrical field application power source for applying an electrical field between an area at which the gas plasma is generated and the substrate, to give the substrate a higher potential and thereby provide a flow of a predetermined amount of current therebetween.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.